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Volumn 49, Issue 12, 2010, Pages 5694-5701

Optimization of a chemical vapor deposition process using sequential experimental design

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; BEST MODEL; CHEMICAL VAPOR; CHEMICAL VAPOR DEPOSITION PROCESS; CONFIDENCE INTERVAL; EMPIRICAL MODEL; EXPERIMENTAL DATA; EXPERIMENTAL DESIGN; EXPERIMENTAL METHODOLOGY; FILM ROUGHNESS; HYBRID MODEL; LINEAR TEMPERATURE DEPENDENCE; MECHANISTIC MODELING; MECHANISTIC MODELS; MODEL PREDICTION; MOLAR FLOW RATES; NUCLEATION DENSITIES; PRECURSOR MATERIALS; PREDICTED PERFORMANCE; PROCESS OPTIMIZATION; PROCESS TEMPERATURE; SEQUENTIAL EXPERIMENTAL DESIGN; STATISTICAL SIGNIFICANCE; SURFACE TEMPERATURES; VACUUM CHAMBERS;

EID: 77953354313     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie901055e     Document Type: Article
Times cited : (12)

References (44)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.