Parametric optimization of microhardness of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 485, Issue 1-2, 2005, Pages 27-41

  Bao, T ^a   Morrison Jr , P W ^b   Woyczynski, W A ^c  

^a MOTOROLA INC   (United States)

^b Case Western Reserve University   (United States)

^c CASE WESTERN RESERVE UNIVERSITY   (United States)

Author keywords

Chemical vapor deposition (CVD); Diamond like (DLC) carbon films; Microhardness; Parametric optimization

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIAMOND CUTTING TOOLS; MICROHARDNESS; OPTIMIZATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS;

DEPOSITION PRESSURES; DIAMOND-LIKE (DLC) CARBON FILMS; PARAMETRIC OPTIMIZATIONS; RADIO FREQUENCY;

AMORPHOUS FILMS;

EID: 21244500093     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.03.026     Document Type: Article

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