Fabrication of multilayered Co/Pd nano-dot array with an areal density of 1 tera-dot/in2

Journal of Magnetism and Magnetic Materials

Volumn 322, Issue 17, 2010, Pages 2585-2588

  Wi, Jung Sub ^a   Lim, Kipil ^a   Wan Kim, Tae ^b   Choi, Sang Jun ^c   Shin, Kyung Ho ^d   Kim, Ki Bum ^a  

^a Seoul National University   (South Korea)

^b Sejong University   (South Korea)

^c Device Solution Samsung Elecronics Co Ltd   (South Korea)

^d Korea Institute of Science and Technology   (South Korea)

Author keywords

Co Pd multilayer; Electron beam lithography; Pattened magnetic media

Indexed keywords

ALTERNATING GRADIENT MAGNETOMETER; AREAL DENSITIES; CO/PD MULTILAYERS; COERCIVITIES; ETCHING STEP; MAGNETIC MEDIA; MULTI-LAYERED; NANO-DOT ARRAYS; NANODOTS; PLASMA ETCHING PROCESS; PROXIMITY EFFECTS; REDEPOSITION; RESIST DEVELOPMENT; ROOM TEMPERATURE; SINGLE DOMAINS; SWITCHING FIELD DISTRIBUTION;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MAGNETIC DEVICES; MAGNETIC FORCE MICROSCOPY; MAGNETOMETERS; MULTILAYERS; PLASMA ETCHING;

MAGNETIC MATERIALS;

EID: 77953323136     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2010.03.025     Document Type: Article

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