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Volumn 53, Issue 3, 2010, Pages 454-457

Valence band structure of strained Si/(111)Si1-xGex

Author keywords

Hole effective mass; KP method; Strained Si; Valence band

Indexed keywords

[110] DIRECTION; CONDUCTION CHANNEL; GE FRACTION; HIGH PERFORMANCE DEVICES; HIGH-SPEED; HOLE EFFECTIVE MASS; K-P METHOD; SI-BASED; STRAINED-SI; VALENCE BAND EDGES;

EID: 77953143070     PISSN: 16747348     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11433-010-0093-2     Document Type: Article
Times cited : (25)

References (9)
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    • Strained Si/SiGe MOS technology: Improving gate dielectric integrity
    • Olsen S H, Yan L, Aqaiby R, et al. Strained Si/SiGe MOS technology: Improving gate dielectric integrity. Microelectron Eng, 2009, 86:218-223
    • (2009) Microelectron Eng. , vol.86 , pp. 218-223
    • Olsen, S.H.1    Yan, L.2    Aqaiby, R.3
  • 4
    • 33646498521 scopus 로고    scopus 로고
    • Calculations of hole mass in [110]-uniaxially strained silicon for the stress-engineering of p-MOS transistors
    • Guillaume T, Mouis M. Calculations of hole mass in [110]-uniaxially strained silicon for the stress-engineering of p-MOS transistors. Solid-State Electron, 2006, 50:701-708
    • (2006) Solid-State Electron , vol.50 , pp. 701-708
    • Guillaume, T.1    Mouis, M.2
  • 5
    • 5444275992 scopus 로고    scopus 로고
    • Si/SiGe heterostructures: From material and physics to devices and circuits
    • Paul D J. Si/SiGe heterostructures: From material and physics to devices and circuits. Semicond Sci Technol, 2004, 19:75
    • (2004) Semicond Sci. Technol. , vol.19 , pp. 75
    • Paul, D.J.1
  • 6
    • 5444231545 scopus 로고    scopus 로고
    • Si/SiGe heterostructure parameters for device simulations
    • Yang L F, Watling J R, Wilkins R C W, et al. Si/SiGe heterostructure parameters for device simulations. Semicond Sci Technol, 2004, 19:1174-1182
    • (2004) Semicond Sci. Technol. , vol.19 , pp. 1174-1182
    • Yang, L.F.1    Watling, J.R.2    Wilkins, R.C.W.3
  • 8
    • 57449093468 scopus 로고    scopus 로고
    • Dispersion relation model of valence band in strained Si
    • Song J J, Zhang H M, Dian X Y, et al. Dispersion relation model of valence band in strained Si. Acta Phys Sin, 2008, 57:7228-7232
    • (2008) Acta Phys. Sin. , vol.57 , pp. 7228-7232
    • Song, J.J.1    Zhang, H.M.2    Dian, X.Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.