Effects of neutralizers on the crystal orientation of YSZ films grown by using ion beam sputtering

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 423-430

  Suh, Ju Hyung ^a   Oh, Sang Ho ^a,c   Kim, Hyung Seok ^a   Choi, Se Young ^b   Park, Chan Gyung ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Yonsei University   (South Korea)

^c Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Interfacial reaction; Ion beam sputtering; Neutralizer; Preferred orientation; Transmission electron microscopy; W nano particle; X ray diffraction; Yttria stabilized zirconia

Indexed keywords

ION BEAM SPUTTERING; NEUTRALIZERS; PREFERRED ORIENTATION; YTTRIA STABILIZED ZIRCONIA;

COATINGS; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; INTERFACES (MATERIALS); ION BEAMS; SPUTTER DEPOSITION; SURFACE REACTIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

YTTRIUM COMPOUNDS;

EID: 2442608355     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.071     Document Type: Article

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