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Volumn , Issue , 2010, Pages 305-307

Parasitic capacitances in double gate MOSFET

Author keywords

Double gate mosfet; Interconnects; Parasitic capacitances; VLSI

Indexed keywords

CAPACITIVE LOADS; CLASSICAL APPROACH; DELAY MODELS; DOUBLE GATE MOSFET; DYNAMIC BEHAVIOURS; GATE DELAYS; INTRINSIC DELAY; MASK LAYOUT; MOS-FET; PARASITIC CAPACITANCE; PARASITIC COMPONENTS; PHYSICAL STRUCTURES; SWITCHING SPEED;

EID: 77953117066     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ITC.2010.24     Document Type: Conference Paper
Times cited : (3)

References (10)
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    • Yuan, C.P.1    Trick, T.2
  • 9
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    • Capacitance-Voltage measurement for characterization of a metal-gate MOS process
    • May
    • Viranjay M. Srivastava, "Capacitance-Voltage measurement for characterization of a metal-gate MOS process", Int. J. of Recent Trends in Engineering (IJRTE), vol. 1, no. 4, pp. 4-7, May 2009 www.academypublisher.com/ ijrte/vol01/no04/ijrte0104004007.pdf
    • (2009) Int. J. of Recent Trends in Engineering (IJRTE) , vol.1 , Issue.4 , pp. 4-7
    • Srivastava, V.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.