Atomic force microscopy study of the growth mechanisms of nanostructured sputtered Au film on Si(111): Evolution with film thickness and annealing time

Journal of Applied Physics

Volumn 107, Issue 10, 2010, Pages

  Ruffino, F ^a,b   Grimaldi, M G ^a,b  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

3D STRUCTURE; ANNEALING TIME; ATOMIC FORCE; AU CLUSTERS; AU FILM; AVRAMI EXPONENT; DYNAMIC GROWTH; DYNAMIC SCALING; DYNAMIC SCALING THEORY; GROWTH MECHANISMS; GROWTH STAGES; LATERAL GROWTH; NANO-STRUCTURED; NANOMETRICS; ROOM TEMPERATURE; ROUGHNESS EXPONENT; SELF-ORGANIZATION MECHANISMS; SI (1 1 1); THREE-DIMENSIONAL (3D); VERTICAL GROWTH;

ANNEALING; ATOMIC FORCE MICROSCOPY; COALESCENCE; DIFFUSION IN SOLIDS; DYNAMICS; FILM GROWTH; GOLD COATINGS; MAGNETIC FILMS; SILICON; SURFACE DIFFUSION; THREE DIMENSIONAL;

GOLD;

EID: 77953014189     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3428467     Document Type: Article

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