Ion fluxes in medium frequency pulsed DC magnetron sputtering

Surface and Coatings Technology

Volumn 204, Issue 20, 2010, Pages 3131-3134

  Rahamathunnisa, M ^a   Cameron, D C ^a  

^a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Chromium nitride; Ion fluxes; Magnetron sputtering

Indexed keywords

CENTRE LINE; CHROMIUM NITRIDE; ION FLOW; ION FLUXES; MAGNETIC FIELD LINE; MEDIUM FREQUENCIES; OVERSHOOT VOLTAGE; PROBE POSITION; PULSE FREQUENCIES; PULSED DC MAGNETRON SPUTTERING; UNBALANCED MAGNETRON; VERY HIGH ENERGIES;

CHROMIUM; MAGNETIC FIELDS; MAGNETRON SPUTTERING; NITRIDES;

IONS;

EID: 77952996950     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.055     Document Type: Article

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