SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 96, Issue 19, 2010, Pages

Generation of ultrahigh frequency air microplasma in a magnetic loop and effects of pulse modulation on operation

(4) Taghioskoui, Mazdak a Perlow, Joshua a Zaghloul, Mona a Montaser, Akbar b

a George Washington University (United States)

b GEORGE WASHINGTON UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; ATMOSPHERIC PRESSURE AIR; FREQUENCY RANGES; MAGNETIC LOOPS; MICRO-PLASMAS; MODULATING SIGNALS; OPERATING FREQUENCY; SELF IGNITION; SQUARE WAVES; ULTRA HIGH FREQUENCY SIGNAL; ULTRA-HIGH FREQUENCY;

ATMOSPHERIC PRESSURE; METAMATERIALS; PLASMA DISPLAY DEVICES;

PULSE MODULATION;

EID: 77952991892 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3429093 Document Type: Article

Times cited : (8)

References (14)

1
- 70349612971
- ABCNBP 1618-2642. 10.1007/s00216-009-2942-2
- S. Weagant and V. Karanassios, Anal. Bioanal. Chem. ABCNBP 1618-2642 395, 577 (2009). 10.1007/s00216-009-2942-2
- (2009) Anal. Bioanal. Chem. , vol.395 , pp. 577
- Weagant, S.¹ Karanassios, V.²

2
- 18744390722
- A microfabricated atmospheric-pressure microplasma source operating in air
- DOI 10.1088/0022-3727/38/11/009, PII S0022372705907249
- J. Hopwood, F. Iza, S. Coy, and D. B. Fenner, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 38, 1698 (2005). 10.1088/0022-3727/38/11/009 (Pubitemid 40871945)
- (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.11 , pp. 1698-1703
- Hopwood, J.¹ Iza, F.² Coy, S.³ Fenner, D.B.⁴

3
- 52349120152
- PPPLA6 1612-8850. 10.1002/ppa200700162
- F. Iza, G. J. Kim, S. M. Lee, J. K. Lee, J. L. Walsh, Y. T. Zhang, and M. G. Kong, Plasma Processes Polym. PPPLA6 1612-8850 5, 322 (2008). 10.1002/ppap.200700162
- (2008) Plasma Processes Polym. , vol.5 , pp. 322
- Iza, F.¹ Kim, G.J.² Lee, S.M.³ Lee, J.K.⁴ Walsh, J.L.⁵ Zhang, Y.T.⁶ Kong, M.G.⁷

4
- 7244242196
- ITPSBD 0093-3813. 10.1109/TPS.2004.832636
- R. E. J. Sladek, E. Stoffels, R. Walraven, P. J. A. Tielbeek, and R. A. Koolhoven, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 32, 1540 (2004). 10.1109/TPS.2004.832636
- (2004) IEEE Trans. Plasma Sci. , vol.32 , pp. 1540
- Sladek, R.E.J.¹ Stoffels, E.² Walraven, R.³ Tielbeek, P.J.A.⁴ Koolhoven, R.A.⁵

5
- 50249163279
- ITPSBD 0093-3813. 10.1109/TPS.2008.924412
- M. Taghioskoui, M. Zaghloul, and A. Montaser, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 36, 1262 (2008). 10.1109/TPS.2008.924412
- (2008) IEEE Trans. Plasma Sci. , vol.36 , pp. 1262
- Taghioskoui, M.¹ Zaghloul, M.² Montaser, A.³

6
- 70350397024
- APPLAB 0003-6951. 10.1063/1.3251793
- Z. Zhang and J. Hopwood, Appl. Phys. Lett. APPLAB 0003-6951 95, 161502 (2009). 10.1063/1.3251793
- (2009) Appl. Phys. Lett. , vol.95 , pp. 161502
- Zhang, Z.¹ Hopwood, J.²

7
- 70349481162
- APPLAB 0003-6951. 10.1063/1.3226679
- S. A. Wright and Y. B. Gianchandani, Appl. Phys. Lett. APPLAB 0003-6951 95, 111504 (2009). 10.1063/1.3226679
- (2009) Appl. Phys. Lett. , vol.95 , pp. 111504
- Wright, S.A.¹ Gianchandani, Y.B.²

8
- 0003449923
- (Wiley, New York).
- A. Montaser, Inductively Coupled Plasma Mass Spectrometry (Wiley, New York, 1998).
- (1998) Inductively Coupled Plasma Mass Spectrometry
- Montaser, A.¹

9
- 67049155955
- APPLAB 0003-6951. 10.1063/1.3129168
- Y. Shimizu, K. Kawaguchi, T. Sasaki, and N. Koshizaki, Appl. Phys. Lett. APPLAB 0003-6951 94, 191504 (2009). 10.1063/1.3129168
- (2009) Appl. Phys. Lett. , vol.94 , pp. 191504
- Shimizu, Y.¹ Kawaguchi, K.² Sasaki, T.³ Koshizaki, N.⁴

10
- 49149109971
- APPLAB 0003-6951. 10.1063/1.2965453
- J. J. Shi, J. Zhang, G. Qiu, J. L. Walsh, and M. G. Kong, Appl. Phys. Lett. APPLAB 0003-6951 93, 041502 (2008). 10.1063/1.2965453
- (2008) Appl. Phys. Lett. , vol.93 , pp. 041502
- Shi, J.J.¹ Zhang, J.² Qiu, G.³ Walsh, J.L.⁴ Kong, M.G.⁵

11
- 34247539523
- Pulsed RF discharges, glow and filamentary mode at atmospheric pressure in argon
- DOI 10.1088/0963-0252/16/2/002, PII S0963025207249357, 002
- N. Balcon, A. Aanesland, and R. Boswell, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 217 (2007). 10.1088/0963-0252/16/2/002 (Pubitemid 46646740)
- (2007) Plasma Sources Science and Technology , vol.16 , Issue.2 , pp. 217-225
- Balcon, N.¹ Aanesland, A.² Boswell, R.³

12
- 18744383092
- Controlled generation of pulse-modulated RF plasmas for materials processing
- DOI 10.1088/0963-0252/14/2/022, PII S0963025205973660
- R. Ye, T. Ishigaki, and T. Sakuta, Plasma Sources Sci. Technol. PSTEEU 0963-0252 14, 387 (2005). 10.1088/0963-0252/14/2/022 (Pubitemid 40665928)
- (2005) Plasma Sources Science and Technology , vol.14 , Issue.2 , pp. 387-396
- Ye, R.¹ Ishigaki, T.² Sakuta, T.³

13
- 0033204541
- Miniaturization of inductively coupled plasma sources
- DOI 10.1109/27.799834
- Y. Yin, J. Messier, and J. A. Hopwood, IEEE Trans. Plasma Sci. ITPSBD 0093-3813 27, 1516 (1999). 10.1109/27.799834 (Pubitemid 32081703)
- (1999) IEEE Transactions on Plasma Science , vol.27 , Issue.5 , pp. 1516-1524
- Yin, Y.¹ Messier, J.² Hopwood, J.A.³

14
- 0038382947
- SCTEEJ 0257-8972. 10.1016/S0257-8972(03)00256-1
- K. Kawajiri, T. Sato, and H. Nishiyama, Surf. Coat. Technol. SCTEEJ 0257-8972 171, 134 (2002). 10.1016/S0257-8972(03)00256-1
- (2002) Surf. Coat. Technol. , vol.171 , pp. 134
- Kawajiri, K.¹ Sato, T.² Nishiyama, H.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.