Generation of micro inductively coupled plasma on a chip

IEEE Transactions on Plasma Science

Volumn 36, Issue 4 PART 1, 2008, Pages 1262-1263

  Taghioskoui, Mazdak ^a   Zaghloul, Mona E ^b   Montaser, Akbar ^a  

^a GEORGE WASHINGTON UNIVERSITY   (United States)

^b George Washington University   (United States)

Author keywords

Coils; Impedance; Instruments; Iterative closest point algorithm; Micro inductively coupled plasma (ICP); Plasma on a chip; Plasmas; Power supplies; Radio frequency

Indexed keywords

HELIUM; INERT GASES; PHOTORESISTS; PLASMAS; POWER GENERATION;

900 MHZ; CHEMICAL-; COILS; COUPLED PLASMAS; IMPEDANCE; INDUCTIVELY COUPLED PLASMA (ICP); INSTRUMENTS; ITERATIVE CLOSEST POINT ALGORITHM; LOW POWERS; LOW VOLTAGES; MICRO INDUCTIVELY COUPLED PLASMA (ICP); NANO-FABRICATION; PLANAR COILS; PLASMA PROCESSING; PLASMA SCIENCE; PLASMA-ON-A-CHIP; POWER SUPPLIES; RADIO FREQUENCY;

INDUCTIVELY COUPLED PLASMA;

EID: 50249163279     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.924412     Document Type: Article

References (3)

1. M. Taghioskoui, R. G. Brennan, M. E. Zaghloul, and A. Montaser, "Novel method of chemical analysis on mars with carbon dioxide inductively coupled micro plasmas," in Proc. Winter Conf. Plasma Spectrochem. Temecula, CA, 2008.
2. J. A. Hopwood, "A microfabricated inductively coupled plasma generator," J. Microelectromech. Syst., vol. 9, no. 3, pp. 309-313, Sep. 2000.
3. R. B. Piejak, V. A. Godyak, and B. M. Alexandrovich, "A simple analysis of an inductive RF discharge," Plasma Sources Sci. Technol., vol. 1, no. 3, pp. 179-186, Aug. 1992.