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Applied Physics Letters

Volumn 96, Issue 19, 2010, Pages

Large scale computer simulations of strain distribution and electron effective masses in silicon 〈 100 〉 nanowires

(2) Tuma, Christian a Curioni, Alessandro a

a IBM RESEARCH ZURICH (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BULK SILICON; CROSS SECTION; ELECTRON EFFECTIVE MASS; EXTERNAL STRAINS; INTRINSIC STRAIN; MULTISCALE METHOD; NONUNIFORM; REALISTIC MODEL; SILICON NANOWIRES; STRAIN DISTRIBUTIONS;

COMPUTER SIMULATION; NANOWIRES;

TENSILE STRAIN;

EID: 77952973386 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3428660 Document Type: Article

Times cited : (10)

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