-
2
-
-
0033901414
-
Effect of edge roughness on magnetization reversal in micron-sized permalloy thin films
-
DOI 10.1016/S0304-8853(99)00603-4
-
J. G. Deak and R. H. Koch, J. Magn. Magn. Mater. JMMMDC 0304-8853 213, 25 (2000). 10.1016/S0304-8853(99)00603-4 (Pubitemid 30589521)
-
(2000)
Journal of Magnetism and Magnetic Materials
, vol.213
, Issue.1
, pp. 25-31
-
-
Deak, J.G.1
Koch, R.H.2
-
4
-
-
45849109171
-
-
NMAACR 1476-1122. 10.1038/nmat2204
-
O. Ozatay, P. G. Gowtham, K. W. Tan, J. C. Read, K. A. Mkhoyan, M. G. Thomas, G. D. Fuchs, P. M. Braganca, E. M. Ryan, K. V. Thadani, J. Silcox, D. C. Ralph, and R. A. Buhrman, Nature Mater. NMAACR 1476-1122 7, 567 (2008). 10.1038/nmat2204
-
(2008)
Nature Mater.
, vol.7
, pp. 567
-
-
Ozatay, O.1
Gowtham, P.G.2
Tan, K.W.3
Read, J.C.4
Mkhoyan, K.A.5
Thomas, M.G.6
Fuchs, G.D.7
Braganca, P.M.8
Ryan, E.M.9
Thadani, K.V.10
Silcox, J.11
Ralph, D.C.12
Buhrman, R.A.13
-
5
-
-
33646755365
-
-
JAPIAU 0021-8979. 10.1063/1.2165138
-
M. Yoshikawa, E. Kitagawa, S. Takahashi, T. Kai, M. Amano, N. Shimomura, T. Kishi, S. Ikegawa, Y. Asao, H. Yoda, K. Nagahara, H. Numata, N. Ishiwata, H. Hada, and S. Tahara, J. Appl. Phys. JAPIAU 0021-8979 99, 08R702 (2006). 10.1063/1.2165138
-
(2006)
J. Appl. Phys.
, vol.99
-
-
Yoshikawa, M.1
Kitagawa, E.2
Takahashi, S.3
Kai, T.4
Amano, M.5
Shimomura, N.6
Kishi, T.7
Ikegawa, S.8
Asao, Y.9
Yoda, H.10
Nagahara, K.11
Numata, H.12
Ishiwata, N.13
Hada, H.14
Tahara, S.15
-
6
-
-
30944431774
-
Magnetic recording read head sensor technology
-
DOI 10.1016/j.crhy.2005.11.001, PII S1631070505001684
-
J. R. Childress and R. E. Fontana, C. R. Phys. CRPOBN 1631-0705 6, 997 (2005). 10.1016/j.crhy.2005.11.001 (Pubitemid 43108755)
-
(2005)
Comptes Rendus Physique
, vol.6
, Issue.9
, pp. 997-1012
-
-
Childress, J.R.1
Fontana Jr., R.E.2
-
7
-
-
0001786886
-
-
JOUSEH 0896-1107.
-
J. Slaughter, R. Dave, M. DeHerrera, M. Durlam, B. Engel, J. Janesky, N. Rizzo, and S. Tehrani, J. Supercond. JOUSEH 0896-1107 15, 19 (2002).
-
(2002)
J. Supercond.
, vol.15
, pp. 19
-
-
Slaughter, J.1
Dave, R.2
Deherrera, M.3
Durlam, M.4
Engel, B.5
Janesky, J.6
Rizzo, N.7
Tehrani, S.8
-
8
-
-
0037185398
-
-
PRLTAO 0031-9007. 10.1103/PhysRevLett.88.047204
-
J. Jorzick, S. O. Demokritov, B. Hillebrands, M. Bailleul, C. Fermon, K. Y. Guslienko, A. N. Slavin, D. V. Berkov, and N. L. Gorn, Phys. Rev. Lett. PRLTAO 0031-9007 88, 047204 (2002). 10.1103/PhysRevLett.88.047204
-
(2002)
Phys. Rev. Lett.
, vol.88
, pp. 047204
-
-
Jorzick, J.1
Demokritov, S.O.2
Hillebrands, B.3
Bailleul, M.4
Fermon, C.5
Guslienko, K.Y.6
Slavin, A.N.7
Berkov, D.V.8
Gorn, N.L.9
-
9
-
-
0037203375
-
-
PRLTAO 0031-9007. 10.1103/PhysRevLett.89.277201
-
J. P. Park, P. Eames, D. M. Engebretson, J. Berezovsky, and P. A. Crowell, Phys. Rev. Lett. PRLTAO 0031-9007 89, 277201 (2002). 10.1103/PhysRevLett.89.277201
-
(2002)
Phys. Rev. Lett.
, vol.89
, pp. 277201
-
-
Park, J.P.1
Eames, P.2
Engebretson, D.M.3
Berezovsky, J.4
Crowell, P.A.5
-
10
-
-
33646726316
-
-
JAPIAU 0021-8979. 10.1063/1.2167633
-
B. B. Maranville, R. D. McMichael, S. A. Kim, W. L. Johnson, C. A. Ross, and J. Y. Cheng, J. Appl. Phys. JAPIAU 0021-8979 99, 08C703 (2006). 10.1063/1.2167633
-
(2006)
J. Appl. Phys.
, vol.99
-
-
Maranville, B.B.1
McMichael, R.D.2
Kim, S.A.3
Johnson, W.L.4
Ross, C.A.5
Cheng, J.Y.6
-
12
-
-
77953019581
-
-
Ph.D. thesis, Massachusetts Institute of Technology
-
M. E. Walsh, Ph.D. thesis, Massachusetts Institute of Technology, 2004.
-
(2004)
-
-
Walsh, M.E.1
-
13
-
-
0000450764
-
3
-
DOI 10.1116/1.580127
-
R. Hsiao, D. Miller, and A. Kellock, J. Vac. Sci. Technol. A JVTAD6 0734-2101 14, 1028 (1996). 10.1116/1.580127 (Pubitemid 126082208)
-
(1996)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.14
, Issue.3 PART 1
, pp. 1028-1032
-
-
Hsiao, R.1
Miller, D.2
Kellock, A.3
-
14
-
-
34250784561
-
20 stripes
-
DOI 10.1063/1.2746406
-
B. B. Maranville, R. D. McMichael, and D. W. Abraham, Appl. Phys. Lett. APPLAB 0003-6951 90, 232504 (2007). 10.1063/1.2746406 (Pubitemid 46960295)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.23
, pp. 232504
-
-
Maranville, B.B.1
McMichael, R.D.2
Abraham, D.W.3
-
16
-
-
0035802445
-
Oxidation of NiFe(20 wt.%) thin films
-
DOI 10.1016/S0921-5107(01)00696-1, PII S0921510701006961
-
W. Brückner, S. Baunack, M. Hecker, J. Thomas, S. Groudeva-Zotova, and C. M. Schneider, Mater. Sci. Eng., B MSBTEK 0921-5107 86, 272 (2001). 10.1016/S0921-5107(01)00696-1 (Pubitemid 32798348)
-
(2001)
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
, vol.86
, Issue.3
, pp. 272-275
-
-
Bruckner, W.1
Baunack, S.2
Hecker, M.3
Thomas, J.4
Groudeva-Zotova, S.5
Schneider, C.M.6
-
17
-
-
33144473571
-
Surface oxidation of Permalloy thin films
-
DOI 10.1103/PhysRevB.73.014420, 014420
-
M. R. Fitzsimmons, T. J. Silva, and T. M. Crawford, Phys. Rev. B PRBMDO 0163-1829 73, 014420 (2006). 10.1103/PhysRevB.73.014420 (Pubitemid 43270355)
-
(2006)
Physical Review B - Condensed Matter and Materials Physics
, vol.73
, Issue.1
, pp. 1-7
-
-
Fitzsimmons, M.R.1
Silva, T.J.2
Crawford, T.M.3
-
18
-
-
0033907279
-
Plasma-induced surface segregation and oxidation in nickel-iron thin films
-
DOI 10.1016/S0169-4332(99)00571-1
-
R. Hsiao and D. Mauri, Appl. Surf. Sci. ASUSEE 0169-4332 157, 185 (2000). 10.1016/S0169-4332(99)00571-1 (Pubitemid 30578643)
-
(2000)
Applied Surface Science
, vol.157
, Issue.3
, pp. 185-190
-
-
Hsiao, R.1
Mauri, D.2
-
20
-
-
0003603277
-
-
National Institute of Standards and Technology, Interagency Report No. NISTIR 6376 (September)
-
M. J. Donahue and D. G. Porter, OOMMF User's Guide, Version 1.0. National Institute of Standards and Technology, Interagency Report No. NISTIR 6376 (September 1999).
-
(1999)
OOMMF User's Guide, Version 1.0
-
-
Donahue, M.J.1
Porter, D.G.2
-
21
-
-
0035356452
-
-
JAPIAU 0021-8979. 10.1063/1.1360390
-
O. Gérardin, H. Le Gall, M. J. Donahue, and N. Vukadiniovic, J. Appl. Phys. JAPIAU 0021-8979 89, 7012 (2001). 10.1063/1.1360390
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 7012
-
-
Gérardin, O.1
Le Gall, H.2
Donahue, M.J.3
Vukadiniovic, N.4
-
22
-
-
20944450830
-
Magnetic normal modes of nanoelements
-
DOI 10.1063/1.1852191, 10J901
-
R. D. McMichael and M. D. Stiles, J. Appl. Phys. JAPIAU 0021-8979 97, 10J901 (2005). 10.1063/1.1852191 (Pubitemid 40866543)
-
(2005)
Journal of Applied Physics
, vol.97
, Issue.10
, pp. 1-3
-
-
McMichael, R.D.1
Stiles, M.D.2
|