Oxidation of NiFe(20 wt.%) thin films

Materials Science and Engineering: B

Volumn 86, Issue 3, 2001, Pages 272-275

  Bruckner W ^a   Baunack, S ^a   Hecker, M ^a   Thomas, J ^a   Groudeva Zotova, S ^a,b   Schneider, C M ^a  

^a IFW DRESDEN   (Germany)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

Auger electron spectroscopy; Electron microscopy; Iron; Nickel; Oxidation; Thin films

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CONCENTRATION (PROCESS); IRON; MAGNETRON SPUTTERING; METALLOGRAPHIC MICROSTRUCTURE; NICKEL COMPOUNDS; OXIDATION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PERMALLOYS;

MAGNETIC THIN FILMS;

EID: 0035802445     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00696-1     Document Type: Article

References (14)

1. Fiziko-chimiceskije svojstva okislov