Plasma-induced surface segregation and oxidation in nickel-iron thin films

Applied Surface Science

Volumn 157, Issue 3, 2000, Pages 185-190

  Hsiao, R ^a   Mauri, D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); ION BOMBARDMENT; MAGNETIC PROPERTIES; METALLIC FILMS; OXIDATION; SEGREGATION (METALLOGRAPHY); TANTALUM;

TANTALUM OXIDE;

NICKEL ALLOYS;

EID: 0033907279     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00571-1     Document Type: Article

References (14)

1. McLean D. Grain Boundaries in Solids. 1957;Clarendon Press, Oxford. Chap. 5.
2. Gibbs J.W. Collected Works. Vol. 1:1957;Yale Univ. Press, New Haven.
3. Williams F.L., Nason D. Surf. Sci. 65:1974;511.
4. Abraham F.F., Tsai N.H., Pound G.M. Surf. Sci. 83:1979;406.
5. Miedema A.R. Z. Metallkd. 69:1978;287.
6. Chellikowsky J.R. Surf. Sci. 139:1984;L197.
7. Swaminarayan S., Srolovitz D.J. Acta Materialia. 44(5):1996;2067.
8. Stefanov P. Vacuum. 47(9):1996;1107.
9. Russel S.W., Rack M.J., Adams D., Alford T.L., Leveine T.E., Nastasi M. J. Electrochem. Soc. 143(7):1996;2349.
10. Lee W.Y., Scherer G., Guarnieri C.R. J. Electrochem. Soc. 126:1979;1533.
11. Lee W.Y., Eldridge J. J. Electrochem. Soc. 124:1977;1747.
12. Hsiao R., Miller D., Kellock A. J. Vac. Sci. Technol. A. 14(3):1996;1028.
13. Keller J.H., Forster J.C., Barnes M.S. J. Vac. Sci. Technol. A. 11:1993;2478.
14. Chattopadhyay B., Wood G.C. Oxid. Met. 2:1970;373.