Analysis of relationship between inorganic gases and fine particles in cleanroom environment

Aerosol and Air Quality Research

Volumn 10, Issue 3, 2010, Pages 245-254

  Lin, I Kai ^a   Bai, Hsunling ^a   Wu, Bi Jun ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

AMCs (Airborne Molecular Contaminants); Cleanroom; Diffusion denuder system (DDS); Micro contamination; Semiconductor device

Indexed keywords

AIRBORNE MOLECULAR CONTAMINANTS; AMCS (AIRBORNE MOLECULAR CONTAMINANTS); CLEANROOM ENVIRONMENT; COMMON SOURCE; CORRELATION COEFFICIENT; DENUDERS; FINE PARTICLES; INORGANIC GAS; INORGANIC SPECIES; MASS CONCENTRATION; MICRO-CONTAMINATION; PARTICLE FORMATION PROCESS; PARTICULATE MASS; PROCESS CHEMICALS; SEMICONDUCTOR FACTORIES; VOLUME CONCENTRATION; WET BENCH;

AMMONIUM COMPOUNDS; CONCENTRATION (PROCESS); CONTAMINATION; GAS FUEL ANALYSIS; LABORATORIES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR SWITCHES; SODIUM;

CLEAN ROOMS;

AEROSOL COMPOSITION; AEROSOL FORMATION; AIR QUALITY; AMMONIA; AMMONIUM; CONCENTRATION (COMPOSITION); CORRELATION; DIFFUSION; GAS; INDOOR AIR; ION; PARTICULATE MATTER; SEMICONDUCTOR INDUSTRY; SULFATE;

EID: 77952799447     PISSN: 16808584     EISSN: 20711409     Source Type: Journal    
DOI: 10.4209/aaqr.2009.10.0065     Document Type: Article

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