Measurement of inorganic acidic gases and particles from the stack of semiconductor and optoelectronic industries

Separation Science and Technology

Volumn 39, Issue 9, 2004, Pages 2223-2234

  Huang, Cheng Hsiung ^a   Ho, Yung Tai ^b   Tsai, Chuen Jinn ^b  

^a YUANPEI UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Detection limit; Inorganic acids; Porous metal denuder; Semiconductor and optoelectronic industries

Indexed keywords

AEROSOLS; CHROMATOGRAPHIC ANALYSIS; EXHAUST GASES; POLYTETRAFLUOROETHYLENES; POROUS MATERIALS;

ACIDIC GASES; OPTOELECTRONIC INDUSTRIES; POROUS METAL DENUDERS;

INORGANIC ACIDS;

HYDROCHLORIC ACID; HYDROFLUORIC ACID; INORGANIC ACID; METAL; NITRIC ACID; PHOSPHORIC ACID; POLITEF; SULFURIC ACID;

ACID MEDIUM; GAS-GAS SEPARATION; INORGANIC COMPOUND; MEASUREMENT METHOD;

AEROSOL; AIR ANALYSIS; AIR POLLUTANT; AIR POLLUTION; AIR SAMPLING; ARTICLE; CALIBRATION; CORRELATION COEFFICIENT; ELECTRONICS; ENVIRONMENTAL PROTECTION; EXHAUST GAS; FILTER; INDUSTRY; ION PAIR CHROMATOGRAPHY; MEASUREMENT; POROSITY; SEMICONDUCTOR; STANDARD;

EID: 3843076396     PISSN: 01496395     EISSN: None     Source Type: Journal    
DOI: 10.1081/SS-120039319     Document Type: Article

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