Deposition and removal of sodium contamination on silicon wafers

Semiconductor Science and Technology

Volumn 15, Issue 1, 2000, Pages 61-66

  Constant, I ^a   Tardif, F ^a   Derrien, J ^b  

^a CEA GRENOBLE   (France)

^b CAMPUS DE LUMINY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; ADSORPTION; CHEMICAL CLEANING; CONTAMINATION; DEPOSITION; HYDROCHLORIC ACID; SODIUM;

LANGMUIR ADSORPTION;

SILICON WAFERS;

EID: 0033639764     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/1/311     Document Type: Article

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