Haze control: Reticle/environment interactions at 193nm

Solid State Technology

Volumn 47, Issue 5, 2004, Pages 69-73

  Johnstone, Eric V ^a   Chovino, Christian ^a   Reyes, Julio ^a   Dieu, Laurent ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HAZE CONTROL; ION CHROMATOGRAPHY; PHOTOMASKS; THERMAL DESORPTION;

ADSORPTION; CONDENSATION; DESORPTION; ELECTRONICS INDUSTRY; GAS CHROMATOGRAPHY; INTEGRATED CIRCUITS; LITHOGRAPHY; RAMAN SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; ULTRAVIOLET RADIATION;

MASKS;

EID: 2942738980     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. K. Bhattacharyya, W. Volk, B. Grenon, D. Brown, J. Ayala, "Investigation of Reticle Defect Formation at DUV Lithography," BACUS 2002.
2. A.J. Dallas, D. Arends, K. Fischer, J. Joriman, K. Graham, et al., "Protecting the DUV Process and Optimizing Optical Transmission," Metrology, Inspection, and Process Control for Microlithography XIV, Vol. 3998, 2000.