A versatile diffractive maskless lithography for single-shot and serial microfabrication

Optics Express

Volumn 18, Issue 11, 2010, Pages 11754-11762

  Jenness, Nathan J ^a,b   Hill, Ryan T ^a   Hucknall, Angus ^a   Chilkoti, Ashutosh ^a   Clark, Robert L ^b  

^a DUKE UNIVERSITY   (United States)

^b University of Rochester   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHICAL USER INTERFACES; LIGHT MODULATION; LIGHT MODULATORS; MICROSTRUCTURE;

DIFFRACTIVE PROPERTIES; FUNCTIONAL ACTIVITIES; INTENSITY DISTRIBUTION; LITHOGRAPHIC SYSTEMS; MASK LESS; MASK-LESS LITHOGRAPHY; MICRO PATTERNING; NM RESOLUTION; PHASE HOLOGRAMS; RAYLEIGH CRITERION; SINGLE-SHOT; SPATIAL LIGHT MODULATORS;

LITHOGRAPHY;

ARTICLE; ELECTRONICS; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LIGHT; MATERIALS; OPTICAL INSTRUMENTATION; REFRACTOMETRY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHT; MANUFACTURED MATERIALS; MINIATURIZATION; OPTICAL DEVICES; REFRACTOMETRY;

EID: 77952791176     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.011754     Document Type: Article

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