Direct laser writing of photoresponsive colloids for microscale patterning of 3D porous structures

Advanced Materials

Volumn 21, Issue 1, 2009, Pages 66-70

  George, Matthew C ^a   Mohraz, Ali ^a,c   Piech, Martin ^b,d   Bell, Nelson S ^b   Lewis, Jennifer A ^a   Braun, Paul V ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c University of California at Irvine   (United States)

^d UNITED TECHNOLOGIES RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOID CHEMISTRY; CONFOCAL MICROSCOPY; POLYMERS; SCANNING; SILICA; THREE DIMENSIONAL;

DIRECT LASER WRITING (DLW); FEATURE SIZES; LASER SCANNING; LASER WRITING; MICRO SCALES; MICROCAVITY (MC); MICROSCALE PATTERNING; SILICA COLLOIDS; THREE-DIMENSIONAL (3D) STRUCTURING;

LASERS;

EID: 58449097660     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200801118     Document Type: Article

References (24)

1. S. Noda, N. Yamamoto, H. Kobayashi, M. Okano, K. Tomoda, Appl. Phys. Lett. 1999, 75, 905.
2. P. Yao, G. Schneider, D. Prather, E. Wetzel, D. O'Brien, Opt. Express 2005, 13, 2370.
3. M. Alvaro, J. F. Aaron, R. Shuvo, J. Micromech. Microeng. 2006, 16, 276.
4. J. Zaumseil, M. A. Meitl, J. W. P. Hsu, B. R. Acharya, K. W. Baldwin, Y. L. Loo, J. A. Rogers, Nono Left. 2003, 3, 1223.
5. P. Dario, M. C. Carrozza, N. Croce, M. C. Montesi, M. Cocco, J. Micromech. Microeng 1995, 5, 64.
6. A. Bertsch, H. Lorenz, P. Renaud, Sens. Actuat. A Phys. 1999, 73, 14.
7. B. H. Cumpston, S. P. Ananthavel, S. Barlow, D. L. Dyer, J. E. Ehrlich, L. L. Erskine, A. A. Heikal, S. M. Kuebler, I. Y. S. Lee, D. McCord-Maughon, J. Qin, H. Rockel, M. Rumi, X.-L. Wu, S. R. Marder, J. W. Perry, Nature 1999, 398, 51.
8. D. Xia, S. R. J. Brueck, J. Vac. Sci. Technol. B. Microelectron. Nanometer Struct. 2005, 23, 2694.
9. D. Therriault, S. R. White, J. A. Lewis, Nat. Mater. 2003, 2, 265.
10. S. Jeon, V. Malyarchuk, J. O. White, J. A. Rogers, Nano Lett. 2005, 5, 1351.
11. S. Jeon, J.-U. Park, R. Cirelll, S. Yang, C. E. Heitzman, P. V. Braun, P. J. A. Kenis, J. A. Rogers, PNAS 2004, 101, 12428.
12. H. D. Gesser, P. C. Goswami, Chem. Rev. 1989, 89, 765.
13. J. E. Smay, G. M. Gratson, R. F. Shepherd, J. Cesarano, J. A. Lewis, Adv. Mater. 2002, 14, 1279.
14. Q. Li, J. A. Lewis, Adv. Mater., 2003, 15, 1639.
15. M. Piech, N. S. Bell, Macromolecules 2006, 39, 915.
16. N. S. Bell, M. Piech, Langmuir 2006, 22, 1420.
17. M. Piech, M. C. George, N. S. Bell, P. V. Braun, Langmuir 2006, 22, 1379.
18. E. Kim, Y. K. Choi, M. H. Lee, S. G. Han, S. R. Keum, The 4th International Conference on Electronic Materials (August 24-27, 1998, Cheju, Korea) 1999, 35, S615.
19. Y. S. Park, Y. Ito, Y. Imanishi, Macromolecules 1998, 31, 2606.
20. A. K. Chibisov, H. Gorner.J. Photochem. Photobiol. A. Chem. 1997, 105, 261.
21. M. W. Carsten Schomburg, Y. Rohlfing, G. Schulz-Ekloff, D. Wöhrle, J. Mater. Chem. 2001, 11, 2014.
22. M. Q. Zhu, L Zhu, J. J. Han, W. Wu, J. K. Hurst, A. D. Q. Li, J. Am. Chem. Soc. 2006, 128, 4303.
23. S. A. Pruzinsky, P. V. Braun, Adv. Funct. Mater. 2005, 15, 1995.
24. B. Kaehr, J. B. Shear,/ Am. Chem. Soc. 2007, 129, 1904.