Surface reaction doping using gas source for ultra shallow junctions

Extended Abstracts of the 1st International Workshop on Junction Technology, IWJT 2000

Volumn , Issue , 2000, Pages 19-22

  Kiyota, Y ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION;

ENERGETIC ION; FUTURE RESEARCH DIRECTIONS; GAS SOURCES; ULTRA SHALLOW JUNCTION; VAPOR PHASE DOPING; ZERO ENERGIES;

SURFACE REACTIONS;

EID: 77952745408     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWIT.2000.928771     Document Type: Conference Paper

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