Photochemical removal of benzene using 172nm Xe2 excimer lamp in N2/O2 mixtures at atmospheric pressure

Bulletin of the Chemical Society of Japan

Volumn 83, Issue 5, 2010, Pages 582-591

  Tsuji, Masaharu ^a   Kawahara, Takashi ^a   Kamo, Naohiro ^a   Miyano, Masato ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COLLISIONAL QUENCHING; DIRECT PHOTOLYSIS; EXCIMER LAMPS; INITIAL STAGES; PHOTO-IRRADIATION; REMOVAL OF BENZENE; TOTAL PRESSURE; VUV PHOTON;

ATMOSPHERIC PRESSURE; BENZENE; PHOTOLYSIS; XENON;

MIXTURES;

EID: 77952374263     PISSN: 00092673     EISSN: 13480634     Source Type: Journal    
DOI: 10.1246/bcsj.20090335     Document Type: Article

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