Photochemical removal of NO, NO 2, and N 2O by 146 nm Kr 2excimer lamp in N 2 at atmospheric pressure

Bulletin of the Chemical Society of Japan

Volumn 82, Issue 2, 2009, Pages 277-284

  Tsuji, Masaharu ^a   Kamo, Naohiro ^a   Kawahara, Takashi ^a   Kawahara, Masashi ^a   Senda, Makoto ^a   Hishinuma, Nobuyuki ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; EXCIMER LAMPS; PHOTO ABSORPTIONS; REMOVAL RATES;

ATMOSPHERIC PRESSURE; LIGHTING; XENON;

KRYPTON;

EID: 60749116941     PISSN: 00092673     EISSN: 13480634     Source Type: Journal    
DOI: 10.1246/bcsj.82.277     Document Type: Article

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