Photochemical removal of N2O in N2 or air using 172nm excimer lamps

Japanese Journal of Applied Physics

Volumn 48, Issue 4, 2009, Pages

  Tsuji, Masaharu ^a   Kamo, Naohiro ^a   Senda, Makoto ^a   Kawahara, Masashi ^a   Kawahara, Takashi ^a   Hishinuma, Nobuyuki ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER GAS; COLLISIONAL QUENCHING; EXCIMER LAMPS; FLOW EXPERIMENTS; HIGH-POWER; PHOTO-IRRADIATION; PHOTO-IRRADIATION TIME; RESIDENCE TIME; TOTAL PRESSURE;

ATMOSPHERIC PRESSURE; LIGHTING; QUENCHING; XENON;

PHOTOLYSIS;

EID: 67849135949     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.046002     Document Type: Article

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