Photochemical removal of NO2 by using 172-nm Xe2 excimer lamp in N2 or air at atmospheric pressure

Journal of Hazardous Materials

Volumn 162, Issue 2-3, 2009, Pages 1025-1033

  Tsuji, Masaharu ^a,b   Kawahara, Masashi ^a   Noda, Kenji ^a   Senda, Makoto ^a   Sako, Hiroshi ^a   Kamo, Naohiro ^a   Kawahara, Takashi ^a   Kamarudin, Khairul Sozana Nor ^c  

^a KYUSHU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITI TEKNOLOGI MALAYSIA   (Malaysia)

Author keywords

deNOx; Excimer lamp; Ozone Environmental technology; VUV photolysis

Indexed keywords

ATMOSPHERIC PRESSURE; ATMOSPHERICS; CATALYSIS; CLIMATOLOGY; LIGHTING; METEOROLOGY; MODAL ANALYSIS; OZONE; PHOTOLYSIS; XENON;

AFTER TREATMENTS; BATCH SYSTEMS; CONSECUTIVE REACTIONS; DENOX; EXCIMER LAMP; FLOW SYSTEMS; HIGH POWERS; REMOVAL RATES; SIMPLE MODELS; VUV PHOTOLYSIS;

IRRADIATION;

NITROGEN; NITROGEN OXIDE;

ATMOSPHERIC PRESSURE; CATALYSIS; IRRADIATION; NITROGEN DIOXIDE; PHOTOCHEMISTRY; REMOVAL EXPERIMENT; XENON;

AIR POLLUTION; ARTICLE; ATMOSPHERIC PRESSURE; CATALYSIS; CHEMICAL REACTION; PHOTOCHEMISTRY; ULTRAVIOLET IRRADIATION; WASTE MANAGEMENT;

AIR; ATMOSPHERIC PRESSURE; LASERS, EXCIMER; NITROGEN; NITROGEN DIOXIDE; PHOTOCHEMISTRY;

EID: 57649215274     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2008.05.136     Document Type: Article

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