Photochemical removal of so2 and CO2 by 172 nm Xe2 and 146 nm Kr2 excimer lamps in N2 or air at atmospheric pressure

Japanese Journal of Applied Physics

Volumn 47, Issue 12, 2008, Pages 8943-8949

  Tsuji, Masaharu ^a   Kawahara, Takashi ^a   Kawahara, Masashi ^a   Kamo, Naohiro ^a   Hishinuma, Nobuyuki ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b USHIO INC   (Japan)

Author keywords

146nm; 172nm; CO2 removal; Environmental technology; Excimer lamp; SO2 removal; Vacuum ultraviolet photolysis

Indexed keywords

ATMOSPHERIC PRESSURE; DECOMPOSITION; KRYPTON; LIGHTING; VACUUM; XENON;

146NM; 172NM; CO2 REMOVAL; ENVIRONMENTAL TECHNOLOGY; EXCIMER LAMP; SO2 REMOVAL; VACUUM ULTRAVIOLET PHOTOLYSIS;

PHOTOLYSIS;

EID: 59349120321     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8943     Document Type: Article

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