Characterization of Fe silicide growth on Si(111) surface by weissenberg RHEED

e-Journal of Surface Science and Nanotechnology

Volumn 7, Issue , 2009, Pages 866-870

  Abukawa, T ^a   Fujisaki, D ^a   Takahashi, N ^a   Sato, S ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Epitaxy; Iron; RHEED; Si(111); Silicide

Indexed keywords

EPITAXIAL GROWTH; IRON; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICIDES;

EPITAXIAL ORIENTATIONS; INTERFACE REACTIONS; REACTIVE DEPOSITION EPITAXY; SI (1 1 1); SI SURFACES; SOLID INTERFACES; SOLID PHASE EPITAXY; THREE-DIMENSIONAL DIFFRACTION;

SURFACE REACTIONS;

EID: 77951816677     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2009.866     Document Type: Article

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