Development of structural phases of iron suicide films on Si(111) studied by LEED, AES and STM

Surface Science

Volumn 377-379, Issue , 1997, Pages 861-865

  Weiss W ^a   Kutschera, M ^a   Starke, U ^a   Mozaffari, M ^b   Reshoft K ^b   Kohler U ^b   Heinz, K ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b UNIVERSITY OF KIEL   (Germany)

Author keywords

Iron silicide; Low energy electron diffraction; Metal semiconductor thin film; Scanning tunneling microscopy; Single crystal epitaxy; Suicides

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; METALLIC FILMS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING FILMS; SILICON; SINGLE CRYSTALS; STOICHIOMETRY; THIN FILMS;

ADATOMS; IRON SILICIDES; SOLID PHASE EPITAXY;

IRON COMPOUNDS;

EID: 0031124104     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01499-9     Document Type: Article

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