High performance transparent thin film transistor with atomic layer deposition ZnO based active channel layer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7603, Issue , 2010, Pages

  Kim, Hyungjun ^a   Lim, S J ^a   Kim, Jae Min ^a   Kim, Do Young ^a  

^a Yonsei University   (South Korea)

Author keywords

Flexible display; Thin film transistor; Transparent devices; ZnO

Indexed keywords

ACTIVE CHANNEL LAYERS; CONTROLLED CONDITIONS; DEVICE PROPERTIES; ELECTRICAL PROPERTY; FILM PROPERTIES; FLEXIBLE SUBSTRATE; LOW GROWTH TEMPERATURE; NITROGEN-DOPING; OXYGEN PLASMAS; RESEARCH EFFORTS; RESISTIVE FILM; THERMAL ALD; TRANSPARENT DEVICES; TRANSPARENT THIN FILM TRANSISTOR; UV-LIGHT; ZNO; ZNO THIN FILM; ZNO-BASED TFT;

BIOACTIVITY; CARRIER CONCENTRATION; DEPOSITION; ELECTRIC PROPERTIES; FABRICATION; FLEXIBLE DISPLAYS; OXYGEN; PLASMA DEPOSITION; THIN FILM TRANSISTORS; THIN FILMS;

ZINC OXIDE;

EID: 77951708709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.843774     Document Type: Conference Paper

References (7)

1. E. M. C. Fortunato, P. M. C. Barquinha, A. C. M. B. G. Pimental, A.M. F. Gonçalves, A. J. S. Marques, L. M. N. Pereira and R. F. P. Martins, Adv. Mat. 17, 590 (2005).
2. H. Kim, J. Vac. Sci. Technol. B, 21, 2231 (2003)
3. S. J. Lim, Jin-Seong Park, Soon-Ju Kwon, and H. Kim, Appl. Phys. Lett. 91, 183517 (2007)
4. S. J. Lim, Soon-Ju Kwon, and H. Kim, Thin Solid Films, 516, 1523 (2008).
5. J. W. P. Hsu, D. R. Tallant, R. L. Simpson, N. A. Missert and R. G. Copeland, Applied Physics Letters 88 (25), 252103-252103 (2006).
6. H. S. Kang, J. W. Kim, S. H. Lim, H. W. Chang, G. H. Kim, J. H. Kim and S. Y. Lee, Superlattices and Microstructures 39 (1-4), 193-201 (2006).
7. Y. Sun and H. Wang, Physica B: Condensed Matter 325, 157-163 (2003).