BiFeO3 thin films deposited on LaNiO3-buffered SiO2/Si substrate

Journal of the American Ceramic Society

Volumn 93, Issue 5, 2010, Pages 1422-1426

  Wu, Jiagang ^a   Wang, John ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BFO FILMS; DENSE FILMS; DEPOSITION TEMPERATURES; ELECTRICAL BEHAVIORS; FERROELECTRIC BEHAVIOR; FILM DEPOSITION TEMPERATURE; FILM TEXTURES; FREQUENCY-DEPENDENT; OFF-AXIS; RADIO FREQUENCY SPUTTERING; SI (100) SUBSTRATE; SI SUBSTRATES;

DEPOSITION; DIELECTRIC RELAXATION; FERROELECTRIC FILMS; OXYGEN; OXYGEN VACANCIES; SILICON COMPOUNDS; SPUTTERING; TEXTURES; THIN FILMS;

FILM GROWTH;

EID: 77951677755     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2009.03579.x     Document Type: Article

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