Growth mechanism of Nb-doped TiO2 sol-gel multilayer films characterized by SEM and focus/defocus TEM

Journal of Sol-Gel Science and Technology

Volumn 53, Issue 2, 2010, Pages 148-153

  Wang, Chun ^a   Meinhardt, Jürgen ^a   Löbmann, Peer ^a  

^a FRAUNHOFER INSTITUTE FOR SILICATE RESEARCH ISC   (Germany)

Author keywords

Nb doping; TCO; TEM; Thin films; Titanium dioxide

Indexed keywords

ANATASE FILMS; DEFOCUS; DENSE FILMS; DOPED-TIO; FIRING CYCLE; GROWTH MECHANISMS; MULTILAYER ARCHITECTURE; NB-DOPING; POLYCRYSTALLINE MICROSTRUCTURE; POST ANNEALING; SEM; SINGLE LAYER; SOL-GEL PROCESSING; TCO; TEM; TIO;

COATINGS; CRYSTALLINE MATERIALS; CRYSTALLITE SIZE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FILM GROWTH; FILM PREPARATION; FIRING (OF MATERIALS); GELS; MICROSTRUCTURE; MULTILAYERS; OXIDES; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SOL-GELS; SOLS; TITANIUM; TITANIUM DIOXIDE;

MULTILAYER FILMS;

EID: 77951671137     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-009-2070-7     Document Type: Article

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