BN coatings prepared by low pressure chemical vapor deposition using boron trichloride-ammonia-hydrogen-argon mixture gases

Surface and Coatings Technology

Volumn 204, Issue 16-17, 2010, Pages 2797-2802

  Cheng, Yu ^a   Yin, Xiaowei ^a   Liu, Yongsheng ^a   Li, Siwei ^a,b   Cheng, Laifei ^a   Zhang, Litong ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b XIAMEN UNIVERSITY   (China)

Author keywords

Boron nitride; Chemical vapor deposition; Coating; Kinetics

Indexed keywords

AFTER-HEAT TREATMENT; APPARENT ACTIVATION ENERGY; ARGON MIXTURE; BN COATING; BORON TRICHLORIDE; DEPOSITION KINETICS; DEPOSITION PROCESS; GRAPHITE SUBSTRATE; HEXAGONAL BORON NITRIDE (H-BN); SOLID PRODUCTS; THERMO DYNAMIC ANALYSIS; TOTAL PRESSURE; TURBOSTRATIC;

ACTIVATION ENERGY; AMMONIA; ARGON; BORON; COATINGS; DEPOSITION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; NITRIDES; THERMOANALYSIS; VAPOR DEPOSITION;

BORON NITRIDE;

EID: 77951298716     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.046     Document Type: Article

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