SCOPUS 정보 검색 플랫폼

Volumn 23, Issue 2, 1988, Pages 509-514

Density and deposition rate of chemical-vapour-deposited boron nitride

Author keywords

[No Author keywords available]

Indexed keywords

ARRHENIUS PLOTS; CVD METHOD; DEPOSITION RATE; GAS PRESSURE;

NITRIDES;

EID: 0023965374 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/BF01174677 Document Type: Article

Times cited : (47)

References (26)

2
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5
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6
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- Humidity Sensitive Electrical Conduction of Polycrystalline Boron Nitride Films
- (1978) Japanese Journal of Applied Physics , vol.17 , pp. 1871
- Kimura, T.¹ Yamamoto, K.² Yugo, S.³

8
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- (1980) J. Electrochem. Soc. , vol.127 , pp. 399
- Ada, A.C.¹ Capio, C.D.²

9
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- Structural and Electronic Characterization of Discharge-Produced Boron Nitride
- (1983) Japanese Journal of Applied Physics , vol.22 , pp. L216
- Miyamoto, H.¹ Hirose, M.² Osaka, Y.³

12
- 0001520710
- An X-ray study of boron nitride
- (1952) Acta Crystallographica , vol.5 , pp. 356
- Pease, R.S.¹

20
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- J. M., Blocher, Jr, H. E., Hintermann, L. H., Hall, Electrochemical Society, Princeton
- (1975) Proceedings of 5th International Conference on Chemical Vapor Deposition , pp. 777
- Clerc, G.¹ Gerlach, P.²

21
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- T. O., Sedgwick, H., Lydtin, Electrochemical Society, Princeton
- (1979) Proceedings of 7th International Conference on Chemical Vapor Deposition , pp. 391
- Malé, G.¹ Salanoubat, D.²

26
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- L. E. Branovich, M. L. Long and W. B. P. Fitzpatrick, AD Report 733292 (1971).

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.