Kinetics and film properties of boron nitride derived from trimethoxyborane/ammonia by CVD

Chemical Vapor Deposition

Volumn 10, Issue 6, 2004, Pages 325-330

  Strakov, Hristo ^a   Hackl, Gerrit ^a   Popovska, Nadja ^a   Gerhard, Helmut ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Boron nitride; Kinetics; Trimethoxyborane

Indexed keywords

ACTIVATION ENERGY; AMMONIA; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON NITRIDE; DEPOSITION TEMPERATURES; TRIMETHOXYBORANE; TURBOSTRATIC BORON NITRIDE (T-BN);

BORON COMPOUNDS;

EID: 11344263235     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200306311     Document Type: Article

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