Investigation of the BN films prepared by low pressure chemical vapor deposition

Surface and Coatings Technology

Volumn 122, Issue 2-3, 1999, Pages 166-175

  Huang, Jow Lay ^a   Pan, Chien Hsiun ^a   Lii, Ding Fwu ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Chinese Naval Academy Kaohsiung   (Taiwan)

Author keywords

Boron nitride; Chemical vapor deposition; Low pressure CVD; Thermodynamics

Indexed keywords

EID: 0008627857     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00306-0     Document Type: Article

References (20)

1. Karim M.Z., Cameron D.C., Hashmi M.S. Vapor deposited boron nitride thin films. Mater. Design. 13:(4):1992;207-214.
2. Motojima S., Tamura Y., Sugiyama K. Low temperature deposition of hexagonal BN films by chemical vapor deposition. Thin Solid Films. 88:(3):1982;269-274.
3. Patibandla N., Luthra K. Chemical vapor deposition of boron nitride. J. Electrochem. Soc. 139:(12):1992;3558-3565.
4. Pavlovic V., Kotter H.R., Meixner C. Chemical vapor deposition of boron nitride using premixed borontrichloride and ammonia. J. Mater. Res. 6:(11):1991;2393-2396.
5. Einset E.O., Patibandla N.B., Luthra K.L. Processing condition for boron nitride coatings in fiber bundles via chemical vapor deposition. J. Am. Ceram. Soc. 77:(12):1994;3081-3086.
6. Matsuda T., Uno N., Nakae H., Hirai T. Synthesis and structure of chemically vapor-deposited boron nitride. J. Mater. Sci. 21:1986;649-658.
7. 3 mixtures: a thermodynamic and experimental approach. J. Less-Common Met. 95:1983;221-246.
8. JANAF Thermochemical Tables. 3rd edition :1985;American Chemical Society/American Institute of Physics for National Institute of Standards Technology.
9. Chemical reaction equilibrium analysis. Smith W.R., Missen R.W. Theory and Algorithms. 1982;139-147 Wiley, New York.
10. Adams A.C., Capio C.D. The chemical deposition of boron-nitride films. J. Electrochem. Soc.: Solid-State Sci. Technol. 127:1980;399-405.
11. Phani A.R. Thin films of boron nitride grown by CVD. Bull. Mater. Sci. 17:(3):1994;219-224.
12. Bath A., Baehr O., Barrada M., Lepley B. Plasma enhanced chemical vapor deposition of boron nitride onto InP. Thin Solid Films. 241:1994;278-281.
13. Montero I., Galan L., Osorio S.P., Martinez-Duart J.M., Perriere J. Structural properties of BN thin films obtained by plasma-enhanced chemical vapour deposition. Surf. Interface Anal. 21:1994;809-813.
14. Powder Diffraction File, Inorganic Section, JCPDS, International Center for Diffraction Data, Swarthmore, PA.
15. Thomas J. Jr., Weston M.E., O'Connor T.E. Turbostratic boron nitride, thermal transformation to ordered-layer-lattice boron nitride. J. Am. Chem. Soc. 84:(24):1962;4619-4622.
16. Lee W.K., Lackey W.J., Agrawal P.K. Kinetic analysis of chemical deposition of boron nitride. J. Am. Ceram. Soc. 74:(10):1991;2642-2648.
17. Matsuda T. Stability to moisture for chemical-vapor deposited boron nitride. J. Mater. Sci. 24:1989;2353-2358.
18. Dana S.S., Maldonado J.R. Low pressure chemical vapor deposition of boro-hydro-nitride films and their use in X-ray masks. J. Vac. Sci. Technol. B: 4:(1):1986;235-239.
19. Nakamura K. Preparation and properties of amorphous boron nitride films by molecular flow chemical vapor deposition. J. Electrochem. Soc.: Solid-State Sci. Technol. 132:(7):1985;1757-1762.
20. Hyder S.B., Yep T.O. Structure and properties of boron nitride films grown by high temperature reactive plasma deposition. J. Electrochem. Soc.: Solid-State Sci. Technol. 123:(11):1976;1721-1724.