Effects of transport gradients in a chemical vapor deposition reactor employing vapor-liquid-solid growth of ternary chalcogenide phase-change materials

Nanotechnology

Volumn 21, Issue 16, 2010, Pages

  Johnson, Derek C ^a   Morris, Wesley D ^b   Prieto, Amy L ^a  

^a Department of Environmental and Radiological Health Sciences   (United States)

^b VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL DIRECTION; CHEMICAL VAPOR DEPOSITION REACTORS; COMPUTATIONAL FLUID DYNAMICS SIMULATIONS; CVD SYNTHESIS; FLOW CONDITION; GROWTH CONDITIONS; GROWTH PRODUCTS; GROWTH SUBSTRATES; INHOMOGENEITIES; MEMORY STORAGE; NANOWIRE ARRAYS; RADIAL DIRECTION; SIMULATION DATA; TERNARY CHALCOGENIDES; VAPOR-LIQUID-SOLID GROWTH; VLS GROWTH;

COMPUTATIONAL FLUID DYNAMICS; GERMANIUM; GROWTH (MATERIALS); LIQUIDS; MORPHOLOGY; NANOWIRES; PHASE CHANGE MATERIALS; STOICHIOMETRY; SYNTHESIS (CHEMICAL); TELLURIUM COMPOUNDS; THREE DIMENSIONAL; VAPORS;

CHEMICAL VAPOR DEPOSITION;

CHALCOGEN; NANOMATERIAL;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; INSTRUMENTATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHASE TRANSITION; SURFACE PROPERTY; ULTRASTRUCTURE;

CHALCOGENS; CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHASE TRANSITION; SURFACE PROPERTIES;

EID: 77950503471     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/16/165604     Document Type: Article

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