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Volumn 21, Issue 16, 2010, Pages
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Self-assembled Bi interconnections produced by on-film formation of nanowires for in situ device fabrication
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Author keywords
[No Author keywords available]
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Indexed keywords
BI NANOWIRES;
BI THIN FILMS;
COMPLEX PATTERNING;
CR ELECTRODE;
DEVICE FABRICATIONS;
FILM FORMATIONS;
I-V MEASUREMENTS;
IN-SITU;
MULTILAYER STRUCTURES;
NANOBRIDGE;
NANOWIRE DEVICES;
NANOWIRE GROWTH;
PATTERNED ELECTRODE;
SELF-ASSEMBLED;
THERMAL-ANNEALING;
TRANSVERSE MAGNETORESISTANCE;
CHROMIUM;
ELECTRIC RESISTANCE;
ELECTRODES;
FILM PREPARATION;
MAGNETIC FIELD EFFECTS;
MAGNETORESISTANCE;
SILICON COMPOUNDS;
NANOWIRES;
BISMUTH;
NANOTUBE;
TITANIUM;
TITANIUM DIOXIDE;
ARTICLE;
ARTIFICIAL MEMBRANE;
CHEMISTRY;
CONFORMATION;
CRYSTALLIZATION;
EQUIPMENT DESIGN;
IMPEDANCE;
MACROMOLECULE;
MAGNETISM;
MATERIALS TESTING;
METHODOLOGY;
PARTICLE SIZE;
SURFACE PROPERTY;
ULTRASTRUCTURE;
BISMUTH;
CRYSTALLIZATION;
ELECTRIC IMPEDANCE;
EQUIPMENT DESIGN;
MACROMOLECULAR SUBSTANCES;
MAGNETICS;
MATERIALS TESTING;
MEMBRANES, ARTIFICIAL;
MOLECULAR CONFORMATION;
NANOTUBES;
PARTICLE SIZE;
SURFACE PROPERTIES;
TITANIUM;
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EID: 77950467092
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/21/16/165302 Document Type: Article |
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Times cited : (6)
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References (18)
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