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Volumn , Issue , 2009, Pages 169-172

Stacked 3-dimensional 6T SRAM cell with independent double gate transistors

Author keywords

[No Author keywords available]

Indexed keywords

3-DIMENSIONAL; 3D MEMORY; 6T-SRAM; AREA REDUCTION; CELL STABILITY; DOUBLE GATE TRANSISTOR; MEMORY CELL; SRAM CELL; WRITE OPERATIONS;

EID: 77950336032     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICICDT.2009.5166288     Document Type: Conference Paper
Times cited : (19)

References (12)
  • 1
    • 65849167245 scopus 로고    scopus 로고
    • 22nm Technology Compatible Fully Functional 0.1um2 6T-SRAM Cell
    • Haran B. S.; et. al, "22nm Technology Compatible Fully Functional 0.1um2 6T-SRAM Cell", IEDM 2008, pp.625-628.
    • (2008) IEDM , pp. 625-628
    • Haran, B.S.1
  • 2
    • 0025628740 scopus 로고
    • A high-performance stacked-CMOS SRAM cell by solid phase growth technique
    • Uemoto Y.; Fujii E.; Nakamura A.; Senda, K., "A high-performance stacked-CMOS SRAM cell by solid phase growth technique", VLSI Technology 1990, pp.21-22.
    • (1990) VLSI Technology , pp. 21-22
    • Uemoto, Y.1    Fujii, E.2    Nakamura, A.3    Senda, K.4
  • 3
    • 4544294543 scopus 로고    scopus 로고
    • The revolutionary and truly 3-dimensional 25F2 SRAM technology with the smallest S3 ( stacked single-crystal Si) cell, 0.16um2, and SSTFT (stacked single-crystal thin film transistor) for ultra high density SRAM
    • Soon-Moon Jung; et. al., "The revolutionary and truly 3-dimensional 25F2 SRAM technology with the smallest S3 ( stacked single-crystal Si) cell, 0.16um2, and SSTFT (stacked single-crystal thin film transistor) for ultra high density SRAM", VLSI Technology 2004, pp. 228-229.
    • (2004) VLSI Technology , pp. 228-229
    • Jung, S.-M.1
  • 4
    • 0023437909 scopus 로고
    • Static-Noise Margin Analysis of MOS SRAM Cells
    • Oct.
    • Seevinck E.; et. al., "Static-Noise Margin Analysis of MOS SRAM Cells", J. Solid-State Circ., Vol.SC-22, No.5, Oct. 1987, pp. 748-754.
    • (1987) J. Solid-State Circ. , vol.22 , Issue.5 , pp. 748-754
    • Seevinck, E.1
  • 5
    • 34548815939 scopus 로고    scopus 로고
    • Sub-1V, Robust and Compact 6T SRAM cell in Double Gate MOS technology
    • Thomas Olivier; et. al., "Sub-1V, Robust and Compact 6T SRAM cell in Double Gate MOS technology", ISCAS 2007, pp.2778-2781.
    • (2007) ISCAS , pp. 2778-2781
    • Olivier, T.1
  • 6
    • 58049086111 scopus 로고    scopus 로고
    • Enhancing noise margins of FinFET SRAM by integrating Vth-controllable flexible-pass-gates
    • Endo Kazuhiko; et. al., "Enhancing noise margins of FinFET SRAM by integrating Vth-controllable flexible-pass-gates", ESSDERC 2008, pp.146-149.
    • (2008) ESSDERC , pp. 146-149
    • Kazuhiko, E.1
  • 9
    • 79960834422 scopus 로고    scopus 로고
    • Low Power SRAM Cell Using Vertical Slit Field Effect Transistor (VeSFET)
    • Weis M.; et. al., "Low Power SRAM Cell Using Vertical Slit Field Effect Transistor (VeSFET)", ESSCIRC Fringe 2008.
    • (2008) ESSCIRC Fringe
    • Weis, M.1
  • 10
    • 70350141754 scopus 로고    scopus 로고
    • Adder Circuits with Transistors Using Independently Controlled Gates
    • in press
    • Weis M.; et. al., "Adder Circuits With Transistors Using Independently Controlled Gates", ISCAS 2009, in press.
    • (2009) ISCAS
    • Weis, M.1
  • 11
    • 77950325934 scopus 로고    scopus 로고
    • 18.02.
    • http:www.immersionlab.nlpdf/ASML PatterningArt E.pdf (18.02.2009)
    • (2009)
  • 12
    • 16244371339 scopus 로고    scopus 로고
    • Variability in sub-100nm SRAM designs
    • Heald R.; Wang P, "Variability in sub-100nm SRAM designs", ICCAD- 2004., pp. 347-352.
    • (2004) ICCAD , pp. 347-352
    • Heald, R.1    Wang, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.