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Volumn , Issue , 2009, Pages 149-154

Technology and design aspects of ultra-thin silicon chips for bendable electronics

Author keywords

CMOS integrated circuits; Electrochemical processes; Flexible structures; Piezoresistivity; Stress

Indexed keywords

3D CIRCUIT; BULK SILICON; CHIP SURFACES; CIRCUIT DESIGNS; CIRCUIT PERFORMANCE; CMOS CHIPS; CMOS GATE; CMOS PROCESSING; CMOS TRANSISTORS; CONTROL WAFERS; ELECTROCHEMICAL PROCESS; ELECTROCHEMICAL PROCESSES; EMERGING MARKETS; FOIL SYSTEM; FULLY OPERATIONAL; MECHANICAL STRESS; MIXED-SIGNAL CIRCUITS; MOS TRANSISTORS; PARAMETER VARIATION; PARAMETRIC YIELD; PIEZORESISTIVE EFFECTS; PIEZORESISTIVITY; PLASTIC ELECTRONICS; PROCESS PARAMETERS; SI CHIPS; STANDARD CMOS PROCESS; SYSTEM OF CHIPS; TECHNOLOGY-BASED; TEST CIRCUIT; ULTRA-THIN; ULTRA-THIN CHIPS; ULTRATHIN SILICON;

EID: 77950315899     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICICDT.2009.5166284     Document Type: Conference Paper
Times cited : (18)

References (11)
  • 2
    • 49549119482 scopus 로고    scopus 로고
    • Study of Interaction between the Function of Grit Size and Residual Damage of an Ultra-Thin Wafer
    • C.Y. Wee and T.B. San, "Study of Interaction between the Function of Grit Size and Residual Damage of an Ultra-Thin Wafer", Proc. ICSE, pp. 163-168, 2002.
    • (2002) Proc. ICSE , pp. 163-168
    • Wee, C.Y.1    San, T.B.2
  • 3
    • 27944500302 scopus 로고    scopus 로고
    • A 10-μm thick RF-ID Tag for Chip-in-Paper Applications
    • R. Dekker et al., "A 10-μm thick RF-ID Tag for Chip-in-Paper Applications", Proc. BCTM, pp. 18-21, 2005.
    • (2005) Proc. BCTM , pp. 18-21
    • Dekker, R.1
  • 4
    • 46049094881 scopus 로고    scopus 로고
    • A Seamless Ultra- Thin Chip Fabrication and Assembly Technology
    • M. Zimmermann et al., "A Seamless Ultra- Thin Chip Fabrication and Assembly Technology", Tech. Dig. IEDM, pp. 1010-1012, 2006.
    • (2006) Tech. Dig. IEDM , pp. 1010-1012
    • Zimmermann, M.1
  • 9
    • 0032650454 scopus 로고    scopus 로고
    • Quasi monocrystalline silicon for thin-film devices
    • T. J. Rinke, R. B. Bergmann, J. H. Werner, .,Quasi monocrystalline silicon for thin-film devices", Applied Physics A, vol. 68, 1999, pp. 705-707.
    • (1999) Applied Physics A , vol.68 , pp. 705-707
    • Rinke, T.J.1    Bergmann, R.B.2    Werner, J.H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.