A novel micromachining process for the fabrication of monocrystalline Si-membranes using porous silicon

TRANSDUCERS 2003 - 12th International Conference on Solid-State Sensors, Actuators and Microsystems, Digest of Technical Papers

Volumn 1, Issue , 2003, Pages 246-249

  Armbruster, S ^a   Schafer F ^a   Lammel, G ^a   Artmann, H ^a   Schelling, C ^a   Benzel, H ^a   Finkbeiner, S ^a   Larmer F ^a   Ruther, R ^b   Paul, O ^b  

^a ROBERT BOSCH GMBH   (Germany)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Biomembranes; CMOS technology; Epitaxial growth; Etching; Fabrication; Geometry; Micromachining; Piezoresistance; Silicon; Vacuum technology

Indexed keywords

ACTUATORS; APPLICATION SPECIFIC INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; COMPOSITE MICROMECHANICS; EPITAXIAL GROWTH; ETCHING; FABRICATION; GEOMETRY; MEMBRANES; MICROMACHINING; MICROSYSTEMS; MIXED SIGNAL INTEGRATED CIRCUITS; MONOCRYSTALLINE SILICON; PRESSURE SENSORS; SILICON; SOLID-STATE SENSORS; SURFACE MICROMACHINING; TRANSDUCERS; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

BIOMEMBRANES; BULK- MICROMACHINING; CMOS TECHNOLOGY; MICROMACHINING PROCESS; PIEZORESISTANCE; PIEZORESISTIVE PRESSURE SENSORS; SURFACE MICROMACHINING TECHNOLOGY; THERMAL REARRANGEMENT;

POROUS SILICON;

EID: 27544461458     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SENSOR.2003.1215299     Document Type: Conference Paper

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