Monocrystalline Si membranes for pressure sensors fabricated by a novel surface micromachining process using porous silicon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4981, Issue , 2003, Pages 65-70

  Artmann, Hans ^a   Schäfer, Frank ^a   Lammel, Gerhard ^a   Armbruster, Simon ^a   Benzel, Hubert ^a   Schelling, Christoph ^a   Weber, Heribert ^a   Vossenberg, Heinz Georg ^a   Gampp, Ronald ^a   Muchow, Joerg ^a   Lärmer, Franz ^a   Finkbeiner, Stefan ^a  

^a ROBERT BOSCH GMBH   (Germany)

Author keywords

Epitaxy; Porous silicon; Pressure sensor; Surface micromachining

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; ETCHING; MICROMACHINING; SENSOR DATA FUSION; SILICON WAFERS; STACKING FAULTS;

PRESSURE SENSORS;

POROUS SILICON;

EID: 0038397485     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479564     Document Type: Conference Paper

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