Correlation between thermal properties and aluminum fractions in CrAlN layers deposited by PVD technique

Vacuum

Volumn 84, Issue 9, 2010, Pages 1067-1074

  Tlili, B ^a,b   Mustapha, N ^a   Nouveau, C ^b   Benlatreche, Y ^b   Guillemot, G ^c   Lambertin, M ^b  

^a UNIVERSITY OF TUNIS EL MANAR   (Tunisia)

^b ENSAM   (France)

^c UNIVERSITÉ LILLE 1   (France)

Author keywords

Conductivity; CrAlN; Density; Microstructure; Residual stress

Indexed keywords

ATOMIC FORCE MICROSCOPES; COLUMNAR GRAIN; CONDUCTIVITY; CRALN; CRN COATING; DEPOSITED COATINGS; DIFFRACTION PEAKS; DIFFUSIVITIES; ENERGY DISPERSIVE ANALYSIS OF X-RAYS; HIGH TEMPERATURE OXIDATION; MAXIMUM HARDNESS; MECHANICAL AND THERMAL PROPERTIES; MIRAGE EFFECTS; MORPHOLOGICAL ALTERATION; NEGATIVE VOLTAGE; REACTIVE NITROGEN; SILICON (100); SIZE AND SHAPE; STITCH PARAMETERS; THERMAL PROPERTIES; TWO-DIMENSIONAL SURFACE;

ALUMINUM; CHROMIUM; COATINGS; HIGH TEMPERATURE APPLICATIONS; MECHANICAL PROPERTIES; MICROSTRUCTURE; MORPHOLOGY; NANOINDENTATION; PHYSICAL VAPOR DEPOSITION; RESIDUAL STRESSES; SODIUM CHLORIDE; THERMODYNAMIC PROPERTIES; TWO DIMENSIONAL; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM COATINGS;

EID: 77950300140     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.01.011     Document Type: Article

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