메뉴 건너뛰기




Volumn , Issue , 2009, Pages 101-104

Asymmetrical write-assist for single-ended SRAM operation

Author keywords

[No Author keywords available]

Indexed keywords

90NM CMOS; AVERAGE POWER; OPERATION FREQUENCY; OPERATION SPEED; POSITIVE FEEDBACK; SINGLE-ENDED; SRAM CELL; STATIC NOISE MARGIN; WRITE MARGIN;

EID: 77949609975     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SOCCON.2009.5398086     Document Type: Conference Paper
Times cited : (6)

References (6)
  • 2
    • 34548862579 scopus 로고    scopus 로고
    • Asymmetrical SRAM Cells with Enhanced Read and Write Margins
    • April
    • K. Kim, J. J. Kim, and C.T. Chuang, "Asymmetrical SRAM Cells with Enhanced Read and Write Margins," Proc. VLSITSA, April, 2007, pp. 162-163.
    • (2007) Proc. VLSITSA , pp. 162-163
    • Kim, K.1    Kim, J.J.2    Chuang, C.T.3
  • 3
    • 34047128129 scopus 로고    scopus 로고
    • A New Single-Ended SRAM Cell with Write-Assist
    • Feb
    • R. F. Hobson, "A New Single-Ended SRAM Cell with Write-Assist, " IEEE Transactions on VLSI, Vol. 15, Issue 2, Feb. 2007, pp. 173-181.
    • (2007) IEEE Transactions on VLSI , vol.15 , Issue.2 , pp. 173-181
    • Hobson, R.F.1
  • 4
    • 47349130704 scopus 로고    scopus 로고
    • A Novel 90nm 8T SRAM Cell With Enhanced Stability
    • May
    • A. Sil, S. Ghosh, and M. Bayoumi, "A Novel 90nm 8T SRAM Cell With Enhanced Stability," Proc. ICICDT, May, 2007, pp. 1-4.
    • (2007) Proc. ICICDT , pp. 1-4
    • Sil, A.1    Ghosh, S.2    Bayoumi, M.3
  • 5
    • 33746369469 scopus 로고    scopus 로고
    • Static Noise Margin Variation for Sub-threshold SRAM in 65-nm CMOS
    • July
    • B. H. Calhoun and A.P. Chandrakasan, "Static Noise Margin Variation for Sub-threshold SRAM in 65-nm CMOS," IEEE Journal of Solid-State Circuits, Vol. 41, Issue 7, July, 2006, pp.1673-1679.
    • (2006) IEEE Journal of Solid-State Circuits , vol.41 , Issue.7 , pp. 1673-1679
    • Calhoun, B.H.1    Chandrakasan, A.P.2
  • 6
    • 51849155910 scopus 로고    scopus 로고
    • Which is the Best Dual-Port SRAM in 45-nm Process Technology? - 8T, 10T Single End, and 10T Differential -
    • June
    • H. Noguchi, S. Okumura, Y. Iguchi, H. Fujiwara, Y. Morita, K. Nii, H. kawaguchi, and M. Yoshimoto, "Which is the Best Dual-Port SRAM in 45-nm Process Technology? - 8T, 10T Single End, and 10T Differential -," Proc. ICICDT, June 2007, pp.55-58.
    • (2007) Proc. ICICDT , pp. 55-58
    • Noguchi, H.1    Okumura, S.2    Iguchi, Y.3    Fujiwara, H.4    Morita, Y.5    Nii, K.6    kawaguchi, H.7    Yoshimoto, M.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.