Fabrication of patterned surfaces by photolithographic exposure of dna hairpins carrying a novel photolabile group

Journal of Experimental Nanoscience

Volumn 5, Issue 1, 2010, Pages 26-39

  Manning, B ^a,b   Leigh, S J ^c   Ramos, R ^a   Preece, J A ^c   Eritja, R ^a  

^a INSTITUTE FOR RESEARCH IN BIOMEDICINE   (Spain)

^b UNIVERSITY COLLEGE DUBLIN   (Ireland)

^c UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Afm; Dna; Oligonucleotides; Photolysis; Sam

Indexed keywords

AFM; COMPLEMENTARY SEQUENCES; DNA HAIRPIN; DNA OLIGONUCLEOTIDES; FLUORESCENT MICROSCOPY; HAIRPIN-DUPLEX; PATTERNED SURFACE; PHOTOLITHOGRAPHIC PROCESS; SINGLE-STRANDED DNA; SPECIFIC RECOGNITION;

ATOMIC FORCE MICROSCOPY; BIOSENSORS; DNA; FABRICATION; OLIGONUCLEOTIDES; PHOTOLITHOGRAPHY; PHOTOLYSIS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

DNA SEQUENCES;

DNA; NANOMATERIAL; OLIGONUCLEOTIDE; SILICON; SILICON DIOXIDE; SINGLE STRANDED DNA;

ARTICLE; ATOMIC FORCE MICROSCOPY; BIOSENSOR; CONTACT ANGLE; CONTROLLED STUDY; DNA SEQUENCE; ELECTRONICS; EPIFLUORESCENCE MICROSCOPE; MOLECULAR RECOGNITION; NUCLEOTIDE SEQUENCE; PHOTOLYSIS; PRIORITY JOURNAL; SEMICONDUCTOR; SURFACE PROPERTY; THICKNESS;

EID: 77949405371     PISSN: 17458080     EISSN: 17458099     Source Type: Journal    
DOI: 10.1080/17458080903242314     Document Type: Article

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