Growth and preferred orientation of ITO thin film deposited by D.C. Magnetron sputtering

Journal of Korean Institute of Metals and Materials

Volumn 45, Issue 10, 2007, Pages 579-586

  Choi, Yong Lak ^a  

^a Soonchunhyang University   (South Korea)

Author keywords

ITO; Microstructure; Preferred orientation; Sputtering; Thin film

Indexed keywords

EID: 77949279846     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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