Super-low turn-on and threshold electric fields of plasma-treated partly Fe-filled carbon nanotube films

Materials Research Bulletin

Volumn 45, Issue 5, 2010, Pages 568-571

  Gui, Xuchun ^a   Wei, Jinquan ^a   Wang, Kunlin ^a   Xu, Eryang ^a   Lv, Ruitao ^a   Zhu, Dan ^a   Guo, Zhigang ^a   Kang, Feiyu ^a   Zhu, Yanqiu ^b   Li, Dejie ^a   Zhu, Hongwei ^a   Wu, Dehai ^a  

^a TSINGHUA UNIVERSITY   (China)

^b UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

A. Nanostructures; B. Vapor deposition; D. Electrical properties

Indexed keywords

A. NANOSTRUCTURES; D. ELECTRICAL PROPERTIES; ELECTRICAL PROPERTY; FE NANOWIRES; FIELD EMISSION PROPERTY; FIELD ENHANCEMENT FACTOR; FILLED CARBON NANOTUBES; NITROGEN PLASMA TREATMENT; PLASMA-INDUCED; STRUCTURAL DEFECT; THIN-WALLED; THRESHOLD ELECTRIC FIELDS;

CARBON FILMS; CARBON NANOTUBES; ELECTRIC FIELDS; FIELD EMISSION; NANOSTRUCTURES; NITROGEN PLASMA; PLASMA APPLICATIONS;

ELECTRIC PROPERTIES;

EID: 77949267694     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2010.01.015     Document Type: Article

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