Plasma etching for purification and controlled opening of aligned carbon nanotubes

Journal of Physical Chemistry B

Volumn 106, Issue 14, 2002, Pages 3543-3545

  Huang, Shaoming ^a   Dai, Liming ^a,b  

^a CSIRO   (Australia)

^b The University of Akron   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON;

AMORPHOUS MATERIALS; ORGANOMETALLICS; PLASMA ETCHING; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NANOTUBES;

EID: 0037061938     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp014047y     Document Type: Article

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