Origin of enhanced field emission characteristics postplasma treatment of multiwalled carbon nanotube array

Applied Physics Letters

Volumn 93, Issue 6, 2008, Pages

  Lee, Kyu ^a   Lim, Seong Chu ^a   Choi, Young Chul ^b,c   Lee, Young Hee ^a  

^a Sungkyunkwan University   (South Korea)

^b Samsung SDI   (South Korea)

^c Hanwha Nanotch   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROPERTIES; FIELD EMISSION; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCOMPOSITES; NANOPORES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES; PLASMA APPLICATIONS; PLASMA DEPOSITION; PLASMAS; WORK FUNCTION;

CHEMICAL-; CURRENT ENHANCEMENT; EMISSION AREA; ENHANCED FIELD EMISSION; FIELD EMISSION PROPERTIES; FIELD ENHANCEMENT FACTOR; MULTI-WALLED CARBON NANOTUBE; MULTI-WALLED CARBON NANOTUBES; PLASMA TREATMENTS; WORK FUNCTIONS;

CARBON NANOTUBES;

EID: 49749111189     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2969783     Document Type: Article

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