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Volumn 26, Issue 5, 2010, Pages 3720-3730

Physical vs photolithographic patterning of plasma polymers: An investigation by ToF-SSIMS and multivariate analysis

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC ACIDS; AFM; ALLYL AMINE; ANALYTICAL TECHNIQUES; ATOMIC FORCE; BIOARRAYS; BIOMEDICAL APPLICATIONS; CHEMICAL PATTERN; CHEMICAL RESOLUTION; MICROPATTERNS; MULTI VARIATE ANALYSIS; PATTERNING TECHNIQUES; PHOTOLITHOGRAPHIC PATTERNING; PLASMA POLYMERS; PLASMA SPECIES; PLASMA SYSTEMS; REGION OF INTEREST; ROI ANALYSIS; SPATIAL RESOLUTION; STATIC SECONDARY ION MASS SPECTROMETRIES; SUBSTRATE MATERIAL; TEM; TIME OF FLIGHT;

EID: 77749317498     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la902930z     Document Type: Article
Times cited : (18)

References (37)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.