Driving characteristics of the electrowetting-on-dielectric device using atomic-layer-deposited aluminum oxide as the dielectric

Microfluidics and Nanofluidics

Volumn 8, Issue 2, 2010, Pages 269-273

  Chang, Jong Hyeon ^a   Choi, Dae Young ^a   Han, Seungoh ^b   Pak, James Jungho ^a  

^a Korea University   (South Korea)

^b Hoseo University   (South Korea)

Author keywords

Aluminum oxide (Al2O3); Atomic layer deposition (ALD); Digital microfluidics; Electrowetting on dielectric (EWOD); Single plate configuration

Indexed keywords

AIR ENVIRONMENT; ALUMINUM OXIDES; APPLIED VOLTAGES; ATOMIC LAYER DEPOSITED; CONTROL ELECTRODE; DIELECTRIC LAYER; DIGITAL MICROFLUIDICS; DRIVING CHARACTERISTICS; DRIVING VOLTAGES; DROPLET VELOCITY; ELECTROWETTING ON DIELECTRICS; HIGH-K DIELECTRIC; HYDROPHOBIC SURFACES; OIL TREATMENT; PLATE CONFIGURATION; REFERENCE ELECTRODES; WATER DROPLETS;

ALUMINA; ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; DIELECTRIC DEVICES; DROP FORMATION; ELECTROCHEMICAL ELECTRODES; HYDROPHOBICITY; MICROFLUIDICS; SURFACE ACTIVE AGENTS; SURFACE CHEMISTRY; SURFACE TREATMENT;

ALUMINUM COATINGS;

EID: 77649238688     PISSN: 16134982     EISSN: 16134990     Source Type: Journal    
DOI: 10.1007/s10404-009-0511-9     Document Type: Article

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